基本信息出版社：Wiley-VCH
页码：798 页
出版日期：2008年10月
ISBN：3527320342
条形码：9783527320349
装帧：精装
正文语种：英语
外文书名：三维集成手册: 三维集成电路的技术与应用
内容简介 在线阅读本书
The first encompassing treatise of this new, but very important field puts the known physical limitations for classic 2D electronics into perspective with the requirements for further electronics developments and market necessities. This two–volume handbook presents 3D solutions to the feature density problem, addressing all important issues, such as wafer processing, die bonding, packaging technology, and thermal aspects.
It begins with an introductory part, which defines necessary goals, existing issues and relates 3D integration to the semiconductor roadmap of the industry, before going on to cover processing technology and 3D structure fabrication strategies in detail. This is followed by fields of application and a look at the future of 3D integration.
The contributions come from key players in the field, from both academia and industry, including such companies as Lincoln Labs, Fraunhofer, RPI, ASET, IMEC, CEA–LETI, IBM, and Renesas.
作者简介 Dr. Philip Garrou, from Microelectronic Consultants of North Carolina, specializes in thin film microelectronic materials and applications, prior to which he was Director of Technology and New Business Development for Dow Chemicals′ Advanced Electronic Materials business. He is a fellow of IEEE and IMAPS, has served as Associate Editor of the IEEE Transactions on Advanced Packaging, has authored two microelectronics texts and is co–author of over 75 peer reviewed publications and book chapters.
Dr. Christopher A. Bower is Senior Research Scientists at Semprius Inc., Durham, NC, where he works on heterogeneous integration of compound semiconductor devices. He previously held positions at Inplane Photonics as a senior process development engineer and as a scientist at RTI International, where he participated in multiple DARPA–funded 3D integration programs. Dr. Bower has authored or co–authored over 40 peer–reviewed publications and holds 2 U.S. patents.
Dr. Peter Ramm is head of the silicon technology department of Fraunhofer IZM in Munich, Germany, where he is responsible for process integration of innovative devices and new materials. Peter Ramm received the physics and Dr. rer. nat. degrees from the University of Regensburg and subsequently worked for Siemens in the DRAM facility. In 1988 he joined Fraunhofer IFT in Munich, focusing since two decades on 3D integration technologies. Dr. Ramm is author or co–author of more than 50 papers and 20 patents.
专业书评 The first encompassing treatise of this new and very important field puts the known physical limitations for classic 2D microelectronics into perspective with the requirements for further microelectronics developments and market necessities. This two- volume handbook presents 3D solutions to the feature density problem, addressing all important issues, such as wafer processing, die bonding, packaging technology, and thermal aspects. It begins with an introductory part, which defines necessary goals, existing issues and relates 3D integration to the semiconductor roadmap of the industry. Before going on to cover processing technology and 3D structure fabrication strategies in detail. This is followed by fields of application and a look at the future of 3D integration.
The editors have assembled contributions from key academic and industrial players in the field, including Intel, Micron, IBM, Infineon, Qimonda, NXP, Philips, Toshiba, Semitool, EVG, Tezzaron, Lincoln Labs, Fraunhofer, RPI, IMEC, CEA-LETI and many others.