A User's Guide to Ellipsometry will enable readers to move beyond limited turn-key applications of ellipsometers. In addition to its comprehensive discussions of the measurement of film thickness and optical constants in film, it also considers the trajectories of the ellipsometric parameters Del and Psi and how changes in materials affect parameters. This volume also addresses the use of polysilicon, a material commonly employed in the microelectronics industry, and the effects of substrate roughness. Three appendices provide helpful references.
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If you are a novice in using ellipsometry you could not pick a better book. If you noticed that certain films, thicknesses or substrates give you problem in measurements with your single wavelength ellipsometer - you will find out why and how to come around them.
The book is devided into two sections. The first section explains how ellipsometry works, treats you to its basic equations, and explains psi-del trajectories for singele and multiple dielectric and absorbing films. It also shows you the ellipsometer's limitations, null points.
The second part consits of case studies. It shows you how to use an ellipsomter to measure very thin films (<50A), ellicit information about polimer etch residues, surface damage, etc.
This is a good book for starters. It provides a good introduction for what ellipsometry is and what information it provides, equations to understand how the this information, a breakdown of the equipment, and several case studies to understand how this can be used for more intricate samples. The only limit is that it is for a one wavelength, one angle instrument.
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